Please use this identifier to cite or link to this item: https://hdl.handle.net/2440/114567
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Type: Journal article
Title: Fabrication of n-type Bi₂Te₃ film using electrophoretic deposition for thermoelectric applications
Other Titles: Fabrication of n-type Bi2Te3 film using electrophoretic deposition for thermoelectric applications
Author: Talebi, T.
Ghomashchi, R.
Talemi, P.
Aminorroaya, S.
Citation: Surface and Coatings Technology, 2018; 343:127-130
Publisher: Elsevier
Issue Date: 2018
ISSN: 0257-8972
Statement of
Responsibility: 
Tahereh Talebi, Reza Ghomashchi, PejmanTalemi, Sima Aminorroaya
Abstract: Fabrication of uniform, crack-free n-type Bi2Te3 films using a fast, cost-effective, electrophoretic deposition method for thermoelectric applications has been reported in this study. The sintering process has been done at 693 K to achieve compact and dense coatings. The microstructures of the surface of the green and sintered films, as well as their thicknesses, have been investigated using SEM, which showed a uniform and even film has resulted using electrophoretic deposition (EPD). Furthermore, the Seebeck coefficients of the green and sintered films have been measured and in-plane Seebeck coefficients of 189 μV/K have been recorded for the sintered film at 500 K.
Keywords: Electrophoretic deposition; Bi2Te3 thick films; microstructure; sintering; seebeck coefficient; thermoelectric materials
Rights: © 2017 Elsevier B.V. All rights reserved.
DOI: 10.1016/j.surfcoat.2017.10.017
Published version: http://dx.doi.org/10.1016/j.surfcoat.2017.10.017
Appears in Collections:Aurora harvest 8
IPAS publications
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