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https://hdl.handle.net/2440/12528
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Type: | Journal article |
Title: | A method for producing uniform dose distributions in the junction regions of large hinge angle electron fields |
Author: | Zavgorodni, S. Beckham, W. Roos, D. |
Citation: | International Journal of Radiation: Oncology - Biology - Physics, 1996; 35(4):765-770 |
Publisher: | Elsevier Science |
Issue Date: | 1996 |
ISSN: | 0360-3016 1879-355X |
Statement of Responsibility: | Sergel F. Zavgorodni, Wayne A. Beckham, Daniel E. Roos |
Abstract: | <h4>Purpose</h4>The planning problems presented by abutting electron fields are well recognized. Junctioning electron fields with a large hinge angle compounds the problems because of the creation of closely situated high dose and low-dose regions.<h4>Methods and materials</h4>The technique involving a compensated superficial x-ray (SXR) field to treat the junction region between electron fields was developed and used in a particular clinical case (treatment of a squamous cell carcinoma of the forehead/scalp). The superficial x-ray beam parameters were chosen and the compensator was designed to make the SXR field complementary to the electron fields.<h4>Results</h4>Application of a compensated SXR field eliminated low dose zones in the junction region and reduced high dose zones to 110%. In the clinical case discussed, the high-dose areas due to the SXR field would not appear because of increased attenuation of the soft X-rays in bone.<h4>Conclusion</h4>The technique proposed produces uniform dose distribution up to 3 cm deep and can be considered as an additional tool for dealing with electron field junctioning problems. |
Keywords: | Dose distribution, Field abutment, Electron beams, Superficial x-ray beam, Compensator |
Rights: | © 1996 Elsevier Science Ltd. |
DOI: | 10.1016/0360-3016(96)00149-6 |
Published version: | http://dx.doi.org/10.1016/0360-3016(96)00149-6 |
Appears in Collections: | Aurora harvest 7 Physics publications |
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