Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/39754
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Type: Conference paper
Title: Low loss silicon window material for submillimeter waves using micromachined artificial dielectrics for anti-reflection coating
Author: Biber, S.
Schneiderbanger, D.
Schmidt, L.
Walther, M.
Fischer, B.
Schwarzer, M.
Jepsen, P.
Citation: IRMMW 2004/THz 2004: Conference digest of the Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics, University of Karlsruhe, Karlsruhe, Germany, September 27 - October 1, 2004 / pp. 105-106.
Publisher: IEEE - Institute of Electrical and Electronics Engineers
Publisher Place: Online
Issue Date: 2004
ISBN: 0780384903
Conference Name: International Conference on Infrared and Millimeter Waves (29th : 2004 : Karlsruhe, Germany)
Statement of
Responsibility: 
Biber, S. ; Schneiderbanger, D. ; Schmidt, L.-P. ; Walther, M. ; Fischer, B. ; Schwarzer, M. ; Jepsen, P.U.
Abstract: A high-resistivity silicon wafer was used to design a broad-band low loss window material for 600 GHz by micromachining an artificial dielectric as a quarter wave transformer on the front and rear side of the wafer. The artificial dielectric is made from a 2-dimensional periodic structure to ensure the same transmission characteristics for horizontally and vertically polarized waves.
Rights: © Copyright 2004 IEEE
RMID: 0020073789
DOI: 10.1109/ICIMW.2004.1421975
Appears in Collections:Electrical and Electronic Engineering publications

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