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|Title:||Low loss silicon window material for submillimeter waves using micromachined artificial dielectrics for anti-reflection coating|
|Citation:||IRMMW 2004/THz 2004: Conference digest of the Joint 29th International Conference on Infrared and Millimeter Waves and 12th International Conference on Terahertz Electronics, University of Karlsruhe, Karlsruhe, Germany, September 27 - October 1, 2004 / pp. 105-106.|
|Publisher:||IEEE - Institute of Electrical and Electronics Engineers|
|Conference Name:||International Conference on Infrared and Millimeter Waves (29th : 2004 : Karlsruhe, Germany)|
|Biber, S. ; Schneiderbanger, D. ; Schmidt, L.-P. ; Walther, M. ; Fischer, B. ; Schwarzer, M. ; Jepsen, P.U.|
|Abstract:||A high-resistivity silicon wafer was used to design a broad-band low loss window material for 600 GHz by micromachining an artificial dielectric as a quarter wave transformer on the front and rear side of the wafer. The artificial dielectric is made from a 2-dimensional periodic structure to ensure the same transmission characteristics for horizontally and vertically polarized waves.|
|Rights:||© Copyright 2004 IEEE|
|Appears in Collections:||Electrical and Electronic Engineering publications|
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