Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/74936
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Type: Journal article
Title: Structure-property-performance of nanocomposite Cr-Si-N films synthesized by a duplex surface treatment technique
Author: Lai, D.
Xu, J.
Xie, Z.
Munroe, P.
Citation: Journal of Materials Research, 2011; 26(24):3020-3031
Publisher: Materials Research Society
Issue Date: 2011
ISSN: 0884-2914
2044-5326
Statement of
Responsibility: 
Daohui Lai, Jiang Xu, Zong-Han Xie, Paul R. Munroe
Abstract: Nanocomposite Cr–Si–N films were prepared on to Ti–6Al–4V substrates by a novel duplex surface treatment technique. Coatings consisting of a Cr₃Si surface layer were deposited using a double cathode glow plasma and subsequent surface plasma nitriding. The surface topography, chemical composition, and microstructure of these treated alloys were analyzed by a variety of surface characterization techniques. The resulting Cr–Si–N films consisted of nanocrystallite CrN grains embedded in amorphous SiNₓ phase. Nanoindentation tests showed that with increasing nitrogen partial pressure the hardness of the Cr–Si–N films increased and the elastic modulus decreased. Wear experiments showed that the Cr–Si–N films produced at a nitrogen partial pressure of 4.5Pa and 800 °C possessed the lowest wear rate and friction coefficient. Moreover, electrochemical measurements in 5 wt% HCl solution indicated that the Cr–Si–N films acted as an effective barrier against acid attack on the alloys.
Keywords: Adhesion; Corrosion; Nanoindentation
Rights: © Materials Research Society 2011
RMID: 0020122798
DOI: 10.1557/jmr.2011.367
Appears in Collections:Mechanical Engineering publications
Materials Research Group publications

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