Please use this identifier to cite or link to this item: http://hdl.handle.net/2440/87947
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Type: Conference paper
Title: Atomic layer deposition of SiO₂ on porous alumina membranes: Controlling the pore size and transport properties
Other Titles: Atomic layer deposition of SiO(2) on porous alumina membranes: Controlling the pore size and transport properties
Author: Velleman, L.
Triani, G.
Evans, P.
Atanacio, A.
Shapter, J.
Losic, D.
Citation: Proceedings of SPIE - The International Society for Optical Engineering, 2008 / vol.7267, pp.1-8
Publisher: Society of Photo-optical Instrumentation Engineers
Publisher Place: Australia
Issue Date: 2008
Series/Report no.: Proceedings of SPIE
ISBN: 9780819475190
ISSN: 0277-786X
1996-756X
Conference Name: SPIE: Smart Materials, Nano+Micro-Smart Systems (08 Dec 2008 - 10 Dec 2008 : Melbourne, VIC)
Statement of
Responsibility: 
Leonora Velleman, Gerry Triani, Peter J. Evans, Armand Atanacio, Joe G. Shapter, and Dusan Losic
Keywords: atomic layer deposition; porous alumina membrane composite membranes; molecular separation
Rights: © 2008 SPIE
RMID: 0020128346
DOI: 10.1117/12.810716
Appears in Collections:Chemical Engineering publications

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